C7460 HAMAMATSU | Alldatasheet

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Multiband Plasma-Process Monitor Model C7460 The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in real-time. Simultaneous measurement from 200 to 950 nm Easy measurement using optical fiber input High levels of accuracy and reliability Software for measurement, analysis and factory integration G G G G

G Highly Accurate and Reliable G Easy to Operate G Intelligent Sensor System STANDARD CONFIGURATION Fiber input optics Main unit MPM Standard Configuration Ethernet (TCP/IP) Computer C7460 RS-232C 12 34 5 1 2 POWER Windows 98, NT, 2000 U9046 Plasma Process Data Aquisition Software PLASMA ETCHINGPLASMA ETCHING SPUTTERINGSPUTTERING CONFIGURATION OF APC WITH MPM (EXAMPLE) C7460 RS-232C 12 34 5 1 2 POWER C7460 RS-232C 12 34 5 1 2 POWER C7460 RS-232C 12 34 5 1 2 POWER C7460 RS-232C 12 34 5 1 2 POWER Optical fiber Script output (end point, plasma fault status, etc) HUBEthernet Ethernet MPM Ethernet Real-Time Plasma MonitoringReal-Time Plasma Monitoring

FEATURES

Up to 60 percent of the time that a piece of semi- conductor manufacturing equipment spends in oper- ation is generally for non productive jobs like plas- ma cleanup, chamber stabilization (seasoning) and system diagnosis. Typical approaches for reducing down-time and repetitive processes like these are to utilize Advanced Process Control (APC) and Sensor Based Process Control (SBPC) technologies with factory LAN services. The MPM allows you to gain full control over processes using information provi- ded by the MPM regarding plasma spectra, etching end-point detection status, plasma fault status, etc. The MPM opens the possibility of significantly in- creasing the efficiency of manufacturing equipment. G Easy Fab Integration The MPM is equipped with a sturdy fiber optic bun- dle, which can conveniently be combined with the plasma chamber. Due to this, and due to its easy-to use software, the MPM is easy to setup and operate. The MPM is not just a spectrograph. It also contains in- ternal data processing capabilities which allow to ex- tract and compress the relevant infomation from the data. The MPM employs a high-resolution compact spec- trograph and a highly sensitive detector which diag- nose plasma with elevated levels of precision. Along with these superior photometric characteris- tics, the MPM is compact, sturdy and offers the high standards of reliability that are required in a manu- facturing environment. The MPM is equipped with several interfaces in- cluding Ethernet and a TCP/IP protocol stack. To- gether with its very verstile software framework this allows the easy integration into existing fab IT infra- structure.

BENEFITS (EXAMPLES) G Easy Plasma Status Settings Real-time monitoring of the plasma process supports easy to make settings for the volume of introduced gas and plasma power. Product yield is increased through improved processing stability, and the early discovery of abnormalities. G Advanced Endpoint Detection G Higher Efficiency through Automatic Cleaning Control Particularly with CVD, in which the chamber must be cleaned each time a wafer is processed, cleaning time has a major effect on actual operating efficiency. The automatic control features greatly improved throughput, increased productivity, and reduced costs. G Monitoring of Impurities and Abnormal Discharges Monitoring of the emission band, which does not occur in normal processes, provides warning of impurities and abnormal dis- charges before they occur, and thus improves yield. L 3-d display of plasma emission of CVD Cleaning (CF4, O2, Ar) of SiN PLASMA CVDPLASMA CVD CLEANINGCLEANING Simultaneous Measurement from 200 nm to 950nm Simultaneous Measurement from 200 nm to 950nm SYSTEM STRUCTURE Driver Software U9046 Plasma Process Data Acquisition Software Network Plasma equipment U8851 End-point Synthesis Tool Database spectrum data with process data control process data Plasma Emission EPD signal control spectrum data formula for end-point detection Optional Standard MPM(C7460) (Hardware) Powerful scripts can be defined as recipes for each endpoint detection. It is possible to use the information in the whole spectrum by means of the unique spectral patterns method. This allows for advanced endpoint control with unprecedented specificity and precision. APPLICATIONS OVERVIEW Due to the high versatility of the hardware and the soft- ware framework, the MPM is suitable for various different applications, without any compromise in performance or convenience. These applications can be grouped into the following categories: G Engineering Tasks Such as process optimization, comparison and matching; trouble-shooting; etc. G Endpoint Control Advanced, highly specific and sensitive end point control. G Fault Detection Highly selective automatic fault detection. G APC Sensor Automatic extraction of highly specific APC key numbers. (Under development)

G Measurement Parameter Setting

  • Measurement interval
  • Exposure time: 20 to 32767 ms
  • Data accumulation: 1 to 32767 spectra
  • Sensor sensitivity: 3 settings (1x, 2x, 5x)
  • Wavelength smoothing: on/off
  • Width for wavelength smoothing: any integer value within 1 to 50 nm
  • Time smoothing (rolling average): on/off
  • Filter for time smoothing: any value within 0 to 100 %
  • Trigger : measurement start trigger G Measurement Script G Script Formula G Judgments SPECIFICATIONS DIMENSIONAL OUTLINE (Unit: mm) G Main Unit (weight: approx.7kg) G Fiber Input Optics (weight: approx.100g) C7460 RS-232C 12 34 5 1 2 262±1 PO WER 200±1 6±1 98.5±1 3±0.5 25±1 325±1 383±1 40 50 3000

0.95 Input side To main unit

Easy Measurement using Optical Fiber Easy Measurement using Optical Fiber Scripts contain measurement conditions as well as formula and judgments applied to the data. Results of script processing can be output via the software and via the analog BNC terminal in real- time. Each etch process will be treated by a tailored script. The maximum number of scripts the MPM can store internally is 100, and one of them is selected as the active one. Each script can contain the definition of up to 32 formulas. All script processing is perfomed inside the MPM and in real-time. Script fomula can be defined to perform math operations between spectral intensities. Besides the four basic algebraic functions, it is also possible to compute smoothing, differentials as well as the special spectral patterns applied for endpoint and fault detection (see section on U8851 in this brochure). Judgments are used to detect endpoint or fault conditions. They are defined by thresholds applied to formula, and they can be chained and combined by logical operators. Fiber aperture (N.A.) 0.2 Bundle length 3 m 200 to 950 nm (Measuring range) 235 to 950 nm (Sensitivity-corrected range) < 2 nm A/D resolution 16 bit 2 outputs BNC; 0 to 10 V 5 outputs (3 outputs for External Trigger) BNC; TTL; High impedance RS-232 Power consumption Fiber input optics Bundle diameter inner: 1 mm; outer: 7 mm Wavelength range Wavelength resolution Analog signal output result of formula calculation Script output result of judgment calculation Busy output Start input BNC; TTL; High impedance BNC; TTL; High impedance; pulse width: min. 40 ms IEEE 802.3 (10BaseT); 10 Mbit/s RJ45 modular connectorInterfaces Ethernet Serial Interface protocol TCP/IP (for Ethernet only) Line voltage AC 100 / 117 / 220 / 240 V ± 10%; 50 / 60 Hz 90 VA

The U9046 is a software which allows to control up to 4 units of C7460 multiband plasma process monitor simultaneously and observe the spectrum of plasma emission during plasma processes. The observed spectrum data are stored in the database automatically and can be analyzed. The highly sensitive end-point detection software U8851 is an option. And also the fault detection software for Advanced Process Control will be available. G Up to 4 units of C7460 can be controlled simultaneously, and all of the spectrum data during plasma process can be observed. Database oriented data storage is available and a fast SQL based data access is allowed. The various ways to trigger the measurement are prepared. The drivers to communicate to the plasma chambers or factory network can be optionally provided. G G G Control Station Control Station allows to control C7460s and observe the spectrum data. The measurement can be triggered by the trigger signal from the plasma chamber and also by the optical trigger. The measurement can be repeated automatically during the several wafers' process. Database The spectrum data observed by the Control Station are stored into the SQL compatible Database. Watchdog The Watchdog software component always monitors the condition of the software, and an error will be reported by an e-mail. Logging The Logging component records the history of the software jobs in a file. Drivers for the Plasma Chambers The Drivers software can be provided to make communication to the plasma chambers or factory network. The Drivers can obtain the information about the process like Process ID and Lot No. and so on. Such information can be stored with the observed spectrum data into the Database. Such a driver is needed typically for endpoint and automatic fault detection installations. Easy Graphical User Interfaces The graphical user interfaces (GUIs) used by the process engineer and by the operators are different and dedicated to their respective tasks. Specifically, the operators' GUI is very easy to use, minimizing the risk of human errors. U9046 consists of several software components to perform the measurement in real time with great flexibility. Drivers Watchdog Logging Communication Layer Database Control Station MPM C7460 G G G G G Plasma Process Data Acquisition Software U9046 OUTLINE Standard Software Plasma Process Data Acquisition Software U9046 Standard Software G

An example of an end-point detection of oxidization film etching (1% or less of aperture ratio) is shown in Fig. 1. Although it was difficult to detect the end-point of a process from the time changes in spectrum intensity by using the conventional method, detection with sufficient accuracy is possible with the U8851. Fig. 1 Comparison of U8851 with conventional method Conventional method U8851 End point S1 (λ) T1 (t) S2 (λ) S3 (λ) T2 (t) T3 (t) G Measurement data D (λ,t) D (l, t) = Average spectrum + S1 (l) × T1 (t) + S2 (l)× T2 (t) + S3 (l) × T3 (t) Fig. 2 Analysis pattern End-point Synthesis Tool U8851 Optional Software The U8851 is an optional software application that is utilized with the Multiband Plasma-Process Monitor C7460 for end- point detection in plasma etching. With the U8851, highly sensitive end-point detection of the conventionally difficult small aperture process has been made possible. In addition, since the process data of several wafers can be analyzed simultaneously, the reliability of the operation formula that performs an end-point detection is improved, the verification of an end-point detection is performed easily, and the stability evaluation of a process can be performed as well. G End-point detection in small aperture process G Simultaneous analysis of several wafers G Stability evaluation of a process End-point Synthesis Tool U8851 Optional Software

Fig. 3 Example of an analysis display (a) : An operation formula is set up. (b) : An operation result is displayed. (c) : Graph of wafer number pair terminal point time is displayed. The C8066 is an optical attenuator for the Multiband Plasma- Process Monitor C7460. It is possible to change the light intensity in five steps (1, 1/10, 1/100, 1/1000, 1/10000) by the button on the front panel or via RS-232C interface. The optimum light intensity for monitoring the plasma emission can thus be obtained. 1The data recorded by the Multiband Plasma-Process Monitor C7460 of the changes in the passage of time of the spectrum is loaded onto the End-point Synthesis Tool U8851. 2With the analysis function of the U8851, the spectrum data, which constantly changes, analyzes what kinds of spectrum patterns are shown by addition, and how each spectrum pattern is carrying out time changes. In Fig. 1 the measured data D (l, t) shows that three spectrum patterns (S 1 [l] to S3 [l]) are mainly shown with the superposition of data which carried out time changes like T1 (t) to T3 (t), respectively focusing on the average spectrum. 3The U8851 can perform end-point detection of a process from spectrum pattern changes obtained in the analysis of 2 with changes in the passage of time. It specifies which spectrum pattern can be utilized for end-point detection with changes in the passage of time and smoothes and differentiates waveforms according to changes in the passage of time to detect an end-point. Moreover, analysis of 2 and 3 can be simultaneously performed on two or more wafers, and the detected end-point time is displayed on a graph. While verifying an end-point detection with these functions, the stability of a process can also be evaluated. (Fig.3) 4The detection operation formula of the acquired end points as mentioned above, can be saved in a file and downloaded into the C7460 as well. In the C7460, end-point detection like in 3 is performed in real time. OUTLINE (a) (b) (c) End-point Synthesis Tool U8851 Optional Software End-point Synthesis Tool U8851 Optional Software Optical Attenuator C8066 Optional Hardware Optical Attenuator C8066 Optional Hardware

# Windows is a trademark of Microsoft Corporation in the U.S.A. G Light Intensity Change in Five Steps With attenuated filter, the light intensity can be changed in five steps (1 to 1/10000). G High-speed and Highly Precise Changing The stepping motor is adopted and a high-speed and highly precise filter change of 0.2 s / step is possible. G Easy Operation The filter can be easily changed via a button on the front panel, or via RS-232C interface. G Wide Wavelength Region The wide wavelength region from ultraviolet to near-infrared (200 to 1000nm) is covered. Attenuated ratio Wavelength region Operation Filter changing time Baud rate Data bit Parity Stop bit Connector Line voltage Power comsumption Conformity specification Ambient operation temperature Ambient strage temperature 200nm to 1000nm Remote operation /Local operation 0.2sec/STEP 38400bps 8bit None 1bit D-sub 9pin AC100 to 120V / 220 to 240V , 50/60Hz 50VA max EMC EN55011:1991 Group1,ClassA EN50082-2:1995 Safety EN61010-1:1993+A.2:1995 0 to + 40°C +10 to + 50°C Functions/ Performance RS-232C Other 170 ±1 OPTICAL ATTENUATOR C8066 OD4OD3OD2OD1OD0 LOCAL ATTENUATOR CONTROL POWER RS-232C 232 ±1 98.5 3 ±0.5 25 ±1 175 ±1 233 ±1 C7460 RS-232C 12 34 5 1 2 POWER OPTICAL ATTENUATOR C8066 OD4OD3OD2OD1OD0 LOCAL ATTENUATOR CONTROL POWER RS-232C 40 50 3000 φ 0.95 Input to Main unit MPM C7460Fiber input optics (Including C7460) Main unit Fiber input optics Computer RS-232C Source light DIMENSIONAL OUTLINE (Unit: mm) SYSTEM CONFIGURATION SPECIFICATIONSFEATURES C8066 Standard Configuration G Main Unit (weight: approx.3.0kg) G Fiber Input Optics (weight: approx.100g) Homepage Address http://www.hamamatsu.com # Product and software package names noted in this documentation are trademarks or registered trademarks of their respective manufacturers. G Subject to local technical requirements and regulations, availability of products included in this promotional material may vary. Please consult with our sales office.. G Information furnished by HAMAMATSU is believed to be reliable. However, no responsibility is assumed for possible inaccuracies or omissions. Specifications and external appearance are subject to change without notice.. © 2002 Hamamatsu Photonics K.K. ISO 9001 Certificate: 09 105 79045 HAMAMATSU PHOTONICS K.K., Systems Division 812 Joko-cho, Hamamatsu City, 431-3196, Japan, Telephone: (81)53-431-0124, Fax: (81)53-435-1574, E-mail:export@sys.hpk.co.jp Germany: Hamamatsu Photonics Deutschland GmbH: Arzbergerstr. 10, D-82211 Herrsching am Ammersee, Germany, Telephone: (49)8152-375-0, Fax: (49)8152-2658, E-mail: info@hamamatsu.de, United Kingdom:Hamamatsu Photonics UK Limited: 2 Howard Court, 10 Tewin Road, Welwyn Garden City, Hertfordshire, AL7 1BW, U.K., Telephone: (44) 1707-294888, Fax: (44) 1707-325777, E-mail: info@hamamatsu.co.uk North Europe: Hamamatsu Photonics Norden AB: Smidesvägen 12, SE-171-41 Solna, Sweden, Telephone: (46)8-509-031-00, Fax: (46)8-509-031-01, E-mail: info@hamamatsu.se - AUG/2002 HPK Created in Japan (PDF) Optical Attenuator C8066 Optional Hardware Optical Attenuator C8066 Optional Hardware