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Technical content

Features & Benefits

  • Maximizes SDS source gas utilization reducing bottle changes resulting in higher tool uptime and lo wer cost-of- ownership
  • Repeatedly controls lo w gas flo ws allo wing for reduced gas consumption using par ameters optimized for implanter source applications Digital control loop pro vides r apid response to set point minimizing process cycle time Increases tool uptime through reduction of “No Problem Found”: MFC replacements Included embedded diagnostics and softw are allowing users to check MFC functionality without remo ving the MFC —E-diagnostics through embedded Ether net interface allows monitoring perf ormance parameters during operation
  • Direct f orm-fit-function replacement f or most common MFCs Reduces in ventory costs through m ulti- gas , multi-range capability
  • Straightforward configur ation and diagnostics through Ether net interface Uses standard w eb browser – no special softw are required Includes remote PC application Bright rotatab le LED displa y pro vides easy vie wing of flow rate, gas type, full scale flo w range, temperature and Ether net address Protected under one or more of the following 7,004,191 or International Patents and Patents pending. πMFC – Low Pressure MASS FlOw C O n TRO ll ER FOR I O n I MP l A nT A PP l ICATIO n S The PFC-20, Low Pressure πMFC mass flow controller provides maximum utilization of Safe Delivery Source gases. Implementation of the Low Pressure πMFC increases tool uptime by reducing the frequency of source gas cylinder changes. It offers accurate and precise control of low gas flows over a wide pressure range with source gas delivery pressure as low as 4 Torr. This πMFC is the latest in MKS products designed specifically for SDS and VAC ® source gases serving the ion implantation industry. The patented valve and sensor designs offer exceptional zero stability and accuracy for all flow conditions while maintaining the ability to rapidly achieve set point and repeatably control the gas flow. Standard-sized MFC footprint and control I/O are compatible with existing gas lines for easy integration and operation. WWW.MKSINST.COM Flow Solutions

Most gases used in the semiconductor industry are supplied at a constant pressure, typically above atmosphere, and are delivered to a process at or below atmosphere. Ion implant gases are now mostly supplied at sub-atmospheric pressure using SDS or VAC source gas technology. These SDS gases are supplied at a sub-atmospheric pressure that decreases as the gas is consumed. This is a critical difference for the mass flow controller, as inlet pressure, was typically constant. Changing inlet pressure can impact an MFC’s capability to both meter and control flow accurately, as well as achieve set-point within an allowable time. The wider the range of inlet pressure that an MFC can control and meet performance criteria is critical to SDS gas utilization and tool uptime. The πMFC-LP was specifically designed for SDS source gases and similar applications. It controls rapidly and accurately from initial SDS pressures of 650 Torr down to pressures well below 10 Torr at the MFC. The digital control electronics have been tuned to provide typical response times of less than 2 seconds. With its ability to accurately meter and control gas flow over this wide pressure range, the SDS source utilization is maximized resulting in fewer bottle changeouts, increased up-time and ultimately lower cost of ownership. See Figure 1 for typical SDS gas utilization as a function of pressure. Figure 1 — SDS Gas Use Rate Efficiency Dimensional Drawing and PinOuts—Swagelok® 4 VCR® Version with Analog 9 Pin D Note: Unless otherwise specified, dimensions are nominal values in inches (mm referenced). The πMFC multi-gas feature allows the user to configure an MFC off-the-shelf for its intended gas further lowering costs through reduced inventory requirements. This feature is enabled through a web browser utility accessed through the device’s Ethernet port. The configuration utility uses a standard web browser – no special software is required.

Full Scale Ranges (N2 equivalent) 2 – 20 sccm Inlet Pressure Range 4 – 1200 Torr (with vacuum at the outlet) Normal Operating Pressure Differential (N2 equivalent) <10 Torr at F .S. flow (with vacuum at the outlet) Maximum Purge Pressure 150 psig Burst Pressure 1500 psig Control Range 2 to 100% of F .S. Typical Accuracy ±1% of set point f or >10 to 100% F .S. and ±0.2% of F .S. for 2 to 10% of F .S. at inlet pressures >20 Torr Repeatability 0.2% of F .S. Resolution 0.1% of Reading T emperature Coefficients Zero ±0.08% of F .S./°C Span ±0.08% of Rdg/°C Controller Settling Time <2 sec. typical above 10% of F .S. at inlet pressures >10 Torr (per Semi Guideline E17-0600) W arm-up Time <30 min. (to within 0.2% of F .S. of steady state performance) Normal Operating Temperature 10 to 50°C Stor age Humidity 0 to 95% Relativ e Humidity, no condensing Storage Temperature -20 to 65°C T emperature Display 0 to 100°C T emperature Readout Units Temperature Accuracy ±2°C T emperature Resolution 0.1°C Mechanical Fittings Swagelok® 4 VCR® Display 4 digits f or value, 4 characters for unit Leak Integrity Exter nal (scc/sec He) <1x10-10 Through Closed Valve <1.0% of FS at 25 psig to atmosphere W etted Materials Standard 316 S .S. VAR (equivalent to 316 S.S. SCQ for semiconductor quality), 316 S .S., Elgiloy, KM-45, NiTi Surface Finish 5 microinch a verage Ra Weight Less than 2 lbs . (0.9 kg) Electrical Connectors Analog (po wer & I/O) 9 pin D male or 15 pin D male Diagnostics Ethernet Input Voltage 15-24 VDC ±5%VDC @ 350mA peak, 250 mA steady state Set P oint Command Signal 0 to 5 VDC Output Signal to 5 VDC Specifications

T P2A 035 500 Ordering Inf ormation πMFC_LowPress - 1/18 © 2007-2018 MKS Instruments, Inc. All rights reserved. MKS products provided subject to the US Export Regulations. Diversion or transfer contrary to US law is prohibited. Specifications are subject to change without notice. mksinst™ is a trademark of MKS Instruments, Inc., Andover, MA. SDS® and VAC® are registered trademarks of ATMI, Inc. and Matheson Tri-Gas, San Jose, CA. Teflon® is a registered Mar keting Co., Solon, OH. R A * The Full Scale flow rate is designated by a three digit number. The first two digits represent the significant digits of the Full Scale flow rate separ ated by a decimal point. The third digit is the exponent of the power of ten. Example flow rate code: 500 is 5.0 x 100 or 5 sccm 151 is 1.5 x 101 or 15 sccm MKS Instruments, Inc. Global Headquarters

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Andover, MA 01810 Tel: 978.645.5500 T el: 800.227.8766 (in U .S.A.) Web: www.mksinst.com MKS Instruments, Inc. Flow Solutions Six Shattuck Road Andover, MA 01810 Tel: 978.975.2350 Ordering Code Example: P2A035500RAT2 Code Configuration π MFC Mass-Flo Controller (multi-gas, multi-range) P2A Gas 013 = Nitrogen = N2 013 096 = Arsenic P entaflouride = AsF5 096 035 = Arsine = AsH3 035 048 = Boron Triflouride = BF3 048 099 = Ger manium Tetraflouride = GeF4 099 023 = Hydrogen Selenide = H2Se 023 031 = Phosphine = PH3 031 062 = Phosphor us Triflouride = PF3 062 088 = Silicon Tetraflouride = SiF4 088 Based on 100% gas concentration, for other gases or mixtures, consult factory. Flow Range Full Scale* 2 sccm consult f actory 5 sccm 500 10 sccm 101 20 sccm 201 Fittings Sw agelok 4 VCR male R Connector 9 pin D A 15 pin D B V alve Nor mally Closed, Teflon® T Flo w Orientation V ertical Flow Hor izontal Flow